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3T Technologies is focusing on the research and development of manufacturing processing solutions for the patterning of thin film devices and circuits.

The core of this activity is based on a highly versatile macro/micro patterning technology brings the potential for achieving low cost patterning over large area substrates based on a simple manufacturing approach using peelable masking.

The peelable mask patterning platform provides versatility through the range of materials and patterning methods that can be applied to provide a unique manufacturing solution.

3T has particular interest in developing patterning solutions for a range of industrial applications including for low temperature deposited oxide semiconductor coatings as applied to transparent microelectronic and photonic applications.

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